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In Situ Endpoint Control Saves Chemicals in Wet Processing
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Applied Co$t Modeling, March 2001
Authors: David Taraci, Jerry Weston, SEZ America
Fred Wertsching, Luxtron Corporation
Abstract:
Investigation of endpoint detection, using cost of ownership analysis, on a pre-lithography backside film-removal step helped to determine how the capital investment of an endpoint detection system affects the cost/good wafer equivalent. Results showed a 12.5% increase in throughput and 14 % savings in process chemicals and consumables. These factors led to an overall reduction in the cost/good wafer equivalent of 10.4% - from $3.46/wafer to $3.10/wafer. The value of adding endpoint control is realized further when increased utilization requires additional tools.
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