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Michael Lercel is the director of the lithography division of SEMATECH and comes as an assignee from IBM Microelectronics, where he most recently worked as manager of Lithography Research and at the company's Semiconductor R&D Center in Hopewell Junction, NY and Yorktown Heights, NY. Lercel has also worked on Next Generation Lithography masks at the IBM Mask Advanced Mask Facility. After working on many different NGL technologies, he hopes to soon see one be successful.
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