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Mark Buehler received his B.S. in chemical engineering from the University of California at Berkeley. He then completed his M.S. and Ph.D. in Chemical Engineering at the University of Washington. In 1991, he joined the Pacific Northwest National Laboratory where his research focused on the synthesis of nanocrystalline materials and electro-separations. He received R&D 100 awards in each of these research areas. In 1995, he joined the Portland Technology Department of Intel Corporation. He has spent most of his 12 years at Intel in the area of CMP working in both metal and oxide polish. He has been involved CMP process development for technology nodes from 250nm through 45nm. He has over 25 peer-reviewed technical publications and 5 patents.
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