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Sematech Cleans Conference, May 4-5, Austin “Emerging Technologies in Semiconductor Surface Preparation” This conference—which brings together dozens of researchers from the semiconductor industry and the university community—will focus on current developments and ITRS challenges in advanced wafer and mask cleaning and surface preparation technologies for the 32nm node and beyond. Scope The Surface Preparation and Cleaning Conference will focus on the needs and challenges in wafer and mask cleaning, including wafer front-end, wafer back-end, advanced mask, and environment, safety and health issues. Attendees can expect to gain a better understanding of the development of current and future technologies and solutions for advanced wafer and mask cleaning and surface preparation. See Who's Speaking Industry experts representing IC manufacturers, suppliers, and research organizations from around the globe will present the industry’s best available data on mask and wafer cleans. Complete information about who's speaking will be available in February 2008. Optional Training Course An optional training is being offered on March 31 in conjunction with the Surface Preparation and Cleaning Conference. More information about this course will be available in January 2008.
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