Takeshi Hattori

received the BS and MS degrees in electrical engineering from Sophia
University, Tokyo, Japan in 1969 and 1971, respectively. He received the Degree of Engineer
from Stanford university, Stanford, CA, in 1975, and the Ph.D. degree from Sophia university in
1980.

In 1971, he joined Sony Corporation, where, at the Sony Research Center, Yokohama,
Japan, he became involved in silicon-materials research, such as clean surface preparation,
thermal oxidation of silicon in the presence of chlorine, and contamination/crystal-defect control
and gettering in the fabrication of both MOS devices and CCD imagers. During 1973-1974, on
leave of absence from Sony, he also worked on silicon device/process development at the
Integrated Circuits Laboratory, Stanford University. Then he became Sony Corporate Chief
Distinguished Engineer, involving in the research and development of next-generation
MOS-LSI devices/processes as well as contamination-control and mini/agile-fab environment
technologies at Sony Technology Center, Atsugi, Japan. As the head of the Ultra Clean
Technology Research Laboratory there, he was also involved in the development of
single-wafer spin cleaning and surface preparation technologies, non-aqueous and
supercritical-fluid cleaning, and yield enhancement strategies, and their implementation in
the firm’s semiconductor manufacturing fabs worldwide. He retired from Sony in 2007, and is
currently with Hattori Consulting. His career spans more than 36 years experience in the
semiconductor field.

He is the author of numerous technical papers and the editor and author of major chapters of
Ultra Clean Surface Processing of Silicon Wafers －Secrets of VLSI Manufacturing. In 2005,
Dr. Hattori received the Werner Kern Award in recognition of his contribution to the
development of innovative wafer cleaning and surface preparation technology. He is a Fellow of
the Electrochemical Society.

Dr. Hattori served as the International Cooperation Committee chair and a member
of the Board of Directors of the Ultra Clean Society (UCS), Tokyo, 1988-2000 until it
closed the activity. He is Vice-Chair of the Executive Committee of the International
Symposium on Semiconductor Manufacturing (ISSM) sponsored by SEMI and IEEE. He
is a founding member of this symposium, and had served as its Program Committee
chair 1992-2002. He is also a member of SEMI’s Japan Regional Standards Committee
as well as SEMI/SEAJ Forum in Japan, the International Symposium on Semiconductor
Devices and Materials (SSDM), the Electrochemical Society’s International Symposium
on Cleaning Technology in Semiconductor Device manufacturing, among others.