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SEZ Sells First Spin-Processor 4200
PHOENIX, Arizona, January 12, 2000 - The SEZ Group (SWX: SEZN) announced that it has sold its Spin-Processor 4200 system to a major U.S. semiconductor company based in the northeast. This is SEZ's first sale of the 4200, a high-throughput, high-yield, multiple-chamber spin-processing system.
SEZ originally delivered the Spin-Processor 4200 in June 1999 for evaluation. The customer tested the equipment for six months and determined that it met expectations. The equipment, purchased in December1999, will be used for proprietary nitride and oxide etching in 200 mm production applications.
"This sale marks a major milestone for SEZ," explained Wolfgang Krammer, COO for SEZ America Inc. "We developed the 4200 specifically for high-throughput applications to make us competitive with batch systems. This highly effective and reliable cleaning tool offers better etch uniformity and selectivity while matching production throughputs for a wide variety of wafer process applications, proving that SEZ offers the market a superior alternative to batch systems."
The Spin-Processor 4200 offers a cost-effective throughput/footprint and investment/throughput ratio for a variety of process applications including polymer removal, diluted HF etching, highly selective oxide removal and non-selective oxide nitride removal. Quick installation, low chemical and de-ionized water consumption and disposal costs are also features of the 4200.
About SEZ
The SEZ Group is a leading supplier of spin-processing equipment to the global semiconductor manufacturing industry. The company's breakthrough proprietary Spin-Processor technology forms the basis of a broad portfolio of backside and frontside wafer surface conditioning products for semiconductor chipmakers worldwide. SEZ maintains development, manufacturing, sales, marketing and service operations in Europe, Asia and North America. Registered in Zurich, Switzerland, SEZ Holding AG is listed on the Swiss Exchange under the symbol (SWX: SEZN).
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